Proceedings of the 2nd Scientific Workshop, Novara, May 3-4, 1989

I: Keynote lectures.- Lithography for High Energy Technology in Microelectronics.- Crosslinking of Industrial Products by High Energy Electron Beams.- Modification of Surface State of Polymers by Glow Discharge Plasmas.- II: Tutorial lectures.- New Frontiers in Materials Processing Using Thermal Plasma Technology.- Deposition and Etching of Fluoropolymer Films by Plasma Technique.- Amorphous Carbon Films.- Materials Processing with Pulsed Electron Beam.- Ion Beam Treatment of Polymers.- UV Lasers and Polymers.- III: Contributed papers.- Kinetic Aspect of PACVD Modeling.- Advanced Technologies for ULSI Device Production.- Design/Operating Parameters Optimization of an Electron Accelerator for Surface Treatments on Materials through Irradiation.- CF4/O2 Plasma Etching of Polymers.- Laser Induced Surface Modification of Polymers.- Wetting Behavior of Oxygen Plasma Treated PTFE.- Author Index.