Electron-Beam Technology in Microelectronic Fabrication presents a unified description of the technology of high resolution lithography. This book is organized into six chapters, each treating a major segment of the technology of high resolution lithography. The book examines topics such as the physics of interaction of the electrons with the polymer resist in which the patterns are drawn, the machines that generate and control the beam, and ways of applying electron-beam lithography in device fabrication and in the making of masks for photolithographic replication. Chapter 2 discusses fundamental processes by which patterns are created in resist masks. Chapter 3 describes electron-beam lithography machines, including some details of each of the major elements in the electron-optical column and their effect on the focused electron beam. Chapter 4 presents the use of electron-beam lithography to make discrete devices and integrated circuits. Chapter 5 looks at the techniques and economics of mask fabrication by the use of electron beams. Finally, Chapter 6 presents a comprehensive description and evaluation of the several high resolution replication processes currently under development. This book will be of great value to students and to engineers who want to learn the unique features of high resolution lithography so that they can apply it in research, development, or production of the next generation of microelectronic devices and circuits.

List of ContributorsPreface1 High Resolution Lithography I. Introduction II. The Need for an Improved Lithography III. Electron-Beam Lithography IV. Technical Benefits of High Resolution Lithography V. Limitations on Electron-Beam Lithography VI. Economic Factors VII. Status and Future of the Technology VIII. The Contents of This Book References2 Electron-Beam Processes I. Introduction II. Electron Scattering in Solids III. Resist Images IV. Electron-Resist Characteristics V. Processing with Electron Resists VI. Electron-Beam Alignment VII. Summary References3 Electron-Beam Lithography Machines I. General Description II. The Electron-Optical Column III. Machine Design and Operating Strategies IV. State-of-the-Art Machine Characteristics References4 Device Fabrication by Electron-Beam Lithography I. Background II. Comparison of Photo- and Electron-Beam Lithography III. Characteristics of Electron-Beam Lithography IV. Electron Devices Made with Electron-Beam Lithography V. Processing Constraints on Electron-Beam Lithography VI. Summary References5 Mask Fabrication by Electron-Beam Lithography I. Introduction II. Mask Fabrication Requirements III. Mask Fabrication Methods IV. Choice of Materials V. Processing VI. Performance VII. Outlook References6 Replication Techniques I. Introduction II. Physics of Replication Systems III. Description of Replication Systems IV. Comparison among the Several Replication Methods ReferencesIndex